Bachelor's in Apparel Design

Rhode Island School of Design (RISD) stands as a leading institution in the world of art and design education, renowned for its comprehensive and rigorous programs. RISD has continued to foster a rich tradition of creativity, innovation, and critical thinking. With a strong emphasis on practical experience and hands-on learning, RISD offers a diverse range of undergraduate and graduate programs spanning various fields, including fine arts, architecture, design, and liberal arts. The school's dynamic curriculum encourages students to explore and experiment, nurturing their artistic talents and nurturing their ability to create impactful works that resonate on a global scale. RISD's commitment to fostering a collaborative and interdisciplinary environment is evident in its vibrant community, comprised of dedicated faculty, accomplished alumni, and aspiring students from diverse backgrounds. The school's state-of-the-art facilities, studios, and exhibition spaces serve as incubators for artistic exploration and expression, providing students with the necessary tools and resources to push the boundaries of traditional artistic practices. Through its strong focus on fostering a deep understanding of art and design principles alongside critical thinking and problem-solving skills, RISD continues to produce visionary artists and designers who shape the cultural landscape and inspire the world.

The four-year Apparel Design BFA at RISD encourages you to develop your unique potential and establish a distinctive design language and identity within the field. Here you learn to articulate your creative process and design concepts, fluidly moving between the physical, visual and technological. Fostering practices rooted in embodied tactile materiality and ethical consciousness, the program asks you to challenge the relentless cycle of contemporary fashion—to slow down, rethink and, through multidisciplinary creative approaches, reimagine the notion of clothing and question the systems of its making.